Team:Cambridge/Protocols/Spin Coating

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==Protocol Name==
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==Spin Coating==
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A method of coating a substrate with a thin film of a solution using a revolving stage and a vacuum that together form a spin coater.
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A method of producing a thin film on a substrate using a revolving stage and vacuum suction.
===Theory===
===Theory===
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The vacuum is switched on to seal the substrate to the rotor via suction. The rotor is started just as the solution of interest is dropped onto the substrate and the centripetal force caused by the rotation spreads the droplet evenly over the substrate surface in all directions.
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* The vacuum is used to hold the substrate in place via suction.  
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* The solution of interest is dropped onto the substrate and the thin film is formed due to the centrifugal force of the spinning rotor
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* The rotation theoretically evenly spreads out the solution out and causes it to evaporate off leaving behind a thin film.
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* Different rotation speeds and different rotation times results in different thickness of thin films, fine tuning is required for optimal results.  
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===Practice===
===Practice===
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Step 1 We found that a 75 microlitre drop of solution dropped onto a substrate around 3-4cm^2 worked well. This is prepared in a pipette and held above the spincoater through an access hole (this should all take place in the fumehood if using hazardous solvents and with the spin coater sealed shut to protect from the otherwise high risk of chemical splash.
 
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Step 2 Initiate the rotor at the same time the solution is dropped. We used 3000rpm for 30 seconds for spin coating for almost all of the spin coated films.
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'''Solution Preparation'''
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* Dissolve desired substance e.g. protein/polymer etc. in desired solvent e.g. HFIP, heptane, acetone and make up to desired concentration e.g. 10% weight-by-weight reflection-HFIP solution.  
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* '''tip:''' Vacuum centrifugation will produce pellets from solution which can be resuspended in the desired solvents
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Step 3 When the spincoater has finished turn off the vacuum and remove the substrate in order to analyze the film.
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'''Loading and Running'''
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# Place desired substrate (in our case silicon or glass) onto the spin-coater and turn on vacuum suction
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# Initialise the run settings, typically spin speed (rpm) and spin time (seconds)
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# Pipette the desired volume onto the substrate, taking care to ensure the entire substrate is coated then close the lid. For volatile solvents like HFIP, it is recommended to pipette through the access hole in the lid and start immediately.
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# Open lid and remove substrate afterwards using tweezers. You may place on hotplate to evaporate remaining solvent
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===Safety===
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* Spin-coating was performed in the fume hood, with appropriate personal protection (in this case, safety goggles, labcoat and nitrile gloves)
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* Keep the spin-coater closed at all times during spin-coating to avoid splashback.
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'''Note: Always check solvent material safety data sheet for relevant safety equipment and first aid procedures'''
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===Safety===
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{{Template:Team:Cambridge/CAM_2011_PROTOCOL_FOOT}}
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Perform in the fume hood if using hazardous solvents, with the appropriate personal protection equipment (in this case, safety goggles, labcoat and nitrile gloves)
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Keep the spin coater closed during spin coating.
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{{Template:Team:Cambridge/CAM_2011_TEMPLATE_FOOT}}
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Latest revision as of 20:37, 21 September 2011

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OVERVIEW
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Contents

Spin Coating

A method of producing a thin film on a substrate using a revolving stage and vacuum suction.

Theory

  • The vacuum is used to hold the substrate in place via suction.
  • The solution of interest is dropped onto the substrate and the thin film is formed due to the centrifugal force of the spinning rotor
  • The rotation theoretically evenly spreads out the solution out and causes it to evaporate off leaving behind a thin film.
  • Different rotation speeds and different rotation times results in different thickness of thin films, fine tuning is required for optimal results.

Practice

Solution Preparation

  • Dissolve desired substance e.g. protein/polymer etc. in desired solvent e.g. HFIP, heptane, acetone and make up to desired concentration e.g. 10% weight-by-weight reflection-HFIP solution.
  • tip: Vacuum centrifugation will produce pellets from solution which can be resuspended in the desired solvents

Loading and Running

  1. Place desired substrate (in our case silicon or glass) onto the spin-coater and turn on vacuum suction
  2. Initialise the run settings, typically spin speed (rpm) and spin time (seconds)
  3. Pipette the desired volume onto the substrate, taking care to ensure the entire substrate is coated then close the lid. For volatile solvents like HFIP, it is recommended to pipette through the access hole in the lid and start immediately.
  4. Open lid and remove substrate afterwards using tweezers. You may place on hotplate to evaporate remaining solvent

Safety

  • Spin-coating was performed in the fume hood, with appropriate personal protection (in this case, safety goggles, labcoat and nitrile gloves)
  • Keep the spin-coater closed at all times during spin-coating to avoid splashback.

Note: Always check solvent material safety data sheet for relevant safety equipment and first aid procedures

Back to Protocols

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