Team:EPF-Lausanne/Tools/Microfluidics/HowTo1

From 2011.igem.org

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(PDMS chip fabrication)
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<p> 1    Place molds into a TMCS vapor chamber for at least 20min</p>
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<p> 1)     Place molds into a TMCS vapor chamber for at least 20min</p>
<p> 2a)  Control layer mixture</p>
<p> 2a)  Control layer mixture</p>
<p> 2b)  Mix for 1 minute, degas for 2 minutes (standard protocol)</p>
<p> 2b)  Mix for 1 minute, degas for 2 minutes (standard protocol)</p>
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<p> 3b)  Mix for 1 minute and degas for 2 minutes (standard protocol)</p>
<p> 3b)  Mix for 1 minute and degas for 2 minutes (standard protocol)</p>
<p> 3c)  Spin coat onto flow layer</p>
<p> 3c)  Spin coat onto flow layer</p>
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<p> 4    Remove control layer mold from vacuum chamber, making sure no bubbles are left on the surface (remove with a toothpick if you see some )</p>
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<p> 4)     Remove control layer mold from vacuum chamber, making sure no bubbles are left on the surface (remove with a toothpick if you see some )</p>
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<p> 5    Place the control and flow layer in a 80C convection oven and incubate for 30 minutes (timing is critical here!)</p>
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<p> 5)     Place the control and flow layer in a 80C convection oven and incubate for 30 minutes (timing is critical here!)</p>
<p> 6a)  Remover wafers both layers from the oven, cut out control layer </p>
<p> 6a)  Remover wafers both layers from the oven, cut out control layer </p>
<p> 6b)  Punch holes </p>
<p> 6b)  Punch holes </p>
<p> 6c)  Align control to the flow layer</p>
<p> 6c)  Align control to the flow layer</p>
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<p> 7    Put aligned device back into 80C oven and incubate for at least 90 minutes (and here you can increase the backing time)</p>
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<p> 7)     Put aligned device back into 80C oven and incubate for at least 90 minutes (and here you can increase the backing time)</p>
<p> 8a)  Remove devices from oven</p>
<p> 8a)  Remove devices from oven</p>
<p> 8b)  Cut them out </p>
<p> 8b)  Cut them out </p>

Revision as of 20:25, 21 September 2011