Team:EPF-Lausanne/Protocols/Master microfabrication for PDMS replica molding

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The protocol below is for a two lithographic steps process, for the case when two different channel heights are needed.
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If one height is needed, as in the case of MITOMI chips fabrication, only one resist configured during one lithographic process is necessary.
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Process Flow:
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The images represent the wafer cross section during the main technological steps:
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[[File:Microchannel fabrication steps - 1.png]]
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[[File:Microchannel fabrication steps - 2.png]]
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Latest revision as of 00:45, 22 September 2011