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Team:EPF-Lausanne/Protocols
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made on 16.05.2011 | made on 16.05.2011 | ||
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<p>'''''Materials: </p> | <p>'''''Materials: </p> | ||
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<p>• Put aligned device back into 80C oven and incubate for at least 90 minutes (and here you can increase the backing time)</p> | <p>• Put aligned device back into 80C oven and incubate for at least 90 minutes (and here you can increase the backing time)</p> | ||
<p>• Remove devices from oven and punch flow layer holes</p> | <p>• Remove devices from oven and punch flow layer holes</p> | ||
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Revision as of 10:20, 16 May 2011
PDMS two layer device fabrication
made on 16.05.2011
Materials:
• flow and control layer molds
• Sylgard 184 silicone elastomer kit: Base part and a Curing agent
• TMCS
Method:
• Place molds into a TMCS vapor chamber
• Control layer mixture: 20g Base + 4g Curing agent
• Mix for 1 minute, degas for 2 minutes (standard protocol)
• pour onto control layer mold and place mold in vacuum chamber
• Flow layer mixture: 20g Base + 1g Curing agent
• Mix for 1 minute and degas for 2 minutes (standard protocol)
• Spin coat onto flow layer at 2200-2400rpm for 35secs (so far you can use my protocol on a spin coater)
• Remove control layer mold from vacuum chamber, making sure no bubbles are left on the surface (remove with a toothpick if you see some )
• Place the control and flow layer in a 80C convection oven and incubate for 30 minutes (timing is critical here!)
• Remove casts from oven, cut out control layer, punch holes, and align to flow layer
• Put aligned device back into 80C oven and incubate for at least 90 minutes (and here you can increase the backing time)
• Remove devices from oven and punch flow layer holes
