Team:EPF-Lausanne/Tools/Microfluidics/HowTo1

From 2011.igem.org

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(Making the chips)
(Making a mould)
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Our moulds are made by photolithography: a layer of AZ or SU-8 resist is spin-coated onto a silicon wafer, then exposed, developed,  
Our moulds are made by photolithography: a layer of AZ or SU-8 resist is spin-coated onto a silicon wafer, then exposed, developed,  
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and etch, to only a positive image of the channels in resist. The mould is thus a plane of silicon, with features made in photoresist. To provide the mould walls, we place the wafer in an aliminium-foil-lined petri dish.
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and etched, to only a positive image of the channels in resist. The mould is thus a plane of silicon, with features made in photoresist. To provide the mould walls, we place the wafer in an aluminium-foil-lined petri dish.
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The complete protocol for the clean room fabrication of the mold can be found [[Team:EPF-Lausanne/Protocols/Master_microfabrication_for_PDMS_replica_molding|here]]. many pictures of the fabrication process in our clean rooms are in our [https://picasaweb.google.com/114670117111403230486/CleanRoomMouldFabrication?authuser=0&feat=directlink picasa gallery]
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The complete protocol for the clean room fabrication of the mold can be found [[Team:EPF-Lausanne/Protocols/Master_microfabrication_for_PDMS_replica_molding|here]]. Many pictures of the fabrication process in our clean rooms are in our [https://picasaweb.google.com/114670117111403230486/CleanRoomMouldFabrication?authuser=0&feat=directlink picasa gallery]
[[File:EPFL-AZ-Robot.JPG|thumb|left|AZ photolithography robot.]]
[[File:EPFL-AZ-Robot.JPG|thumb|left|AZ photolithography robot.]]

Revision as of 01:28, 22 September 2011