Team:EPF-Lausanne/Protocols/Master microfabrication for PDMS replica molding

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The protocol below is for a two lithographic steps process, for the case when two different channel heights are needed.  
The protocol below is for a two lithographic steps process, for the case when two different channel heights are needed.  
If one height is needed, as in the case of MITOMI chips fabrication, only one resist configured during one lithographic process is necessary.
If one height is needed, as in the case of MITOMI chips fabrication, only one resist configured during one lithographic process is necessary.
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Cross section images of the wafer during the main technological steps
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Process Flow:
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The images represent the wafer cross section during the main technological steps:
[[File:Microchannel fabrication steps - 1.png]]
[[File:Microchannel fabrication steps - 1.png]]
[[File:Microchannel fabrication steps - 2.png]]
[[File:Microchannel fabrication steps - 2.png]]
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Latest revision as of 00:45, 22 September 2011

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