Team:EPF-Lausanne/Tools/Microfluidics/HowTo1

From 2011.igem.org

(Difference between revisions)
(PDMS chip fabrication)
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Moulding is the most common task: it must be done over and over again, as the chips are usually single use. Again, this requires specific equipment not usually found in a bio lab. So unless a friendly lab in your neighbourhood is equipped, you'll probably have to order the chips.
Moulding is the most common task: it must be done over and over again, as the chips are usually single use. Again, this requires specific equipment not usually found in a bio lab. So unless a friendly lab in your neighbourhood is equipped, you'll probably have to order the chips.
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==Making a mould==
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Our moulds are made by photolithography: a layer of AZ or SU-8 resist is spin-coated onto a silicon wafer, then exposed, developed,
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and etch, to only a positive image of the channels in resist. The mould is thus a plane of silicon, with features made in photoresist. To provide the mould walls, we place the wafer in an aliminium-foil-lined petri dish.
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The complete protocol for the clean room fabrication of the mold can be found [[Team:EPF-Lausanne/Protocols/Master_microfabrication_for_PDMS_replica_molding|here]]. many pictures of the fabrication process in our clean rooms are in our [https://picasaweb.google.com/114670117111403230486/CleanRoomMouldFabrication?authuser=0&feat=directlink picasa gallery]
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[[File:EPFL-AZ-Robot.JPG|thumb|left|AZ photolithography robot.]]
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[[File:EPFL-Mask-Aligner.JPG|thumb|left|Changing masks on the mask aligner.]]
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[[File:EPFL-Wetbench.JPG|thumb|left|Wet bench for SU8 development.]]
==PDMS==
==PDMS==
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For more information on PDMS chip fabrication: Mcdonald, J.C. et al. Fabrication of microfluidic systems in poly (dimethylsiloxane). Electrophoresis 21, 27–40(2000).
For more information on PDMS chip fabrication: Mcdonald, J.C. et al. Fabrication of microfluidic systems in poly (dimethylsiloxane). Electrophoresis 21, 27–40(2000).
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==Making a mould==
 
-
 
-
Our moulds are made by photolithography: a layer of AZ or SU-8 resist is spin-coated onto a silicon wafer, then exposed, developed,
 
-
and etch, to only a positive image of the channels in resist. The mould is thus a plane of silicon, with features made in photoresist. To provide the mould walls, we place the wafer in an aliminium-foil-lined petri dish.
 
-
 
-
The complete protocol for the clean room fabrication of the mold can be found [[Team:EPF-Lausanne/Protocols/Master_microfabrication_for_PDMS_replica_molding|here]]. many pictures of the fabrication process in our clean rooms are in our [https://picasaweb.google.com/114670117111403230486/CleanRoomMouldFabrication?authuser=0&feat=directlink picasa gallery]
 
-
 
-
[[File:EPFL-AZ-Robot.JPG|thumb|left|AZ photolithography robot.]]
 
-
[[File:EPFL-Mask-Aligner.JPG|thumb|left|Changing masks on the mask aligner.]]
 
-
[[File:EPFL-Wetbench.JPG|thumb|left|Wet bench for SU8 development.]]
 
== Making the chips ==
== Making the chips ==

Revision as of 00:59, 22 September 2011