Team:EPF-Lausanne/Notebook/May2011

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Note: this is not week 1. We are just writing here to have it somewhere

Wednesday, 11 May 2011

SU8 Training for Lilia, Vincent, and Douglas. We made one complete flow wafer.

Work done, initially on four blank wafers:

  • O2 plasma stripped
  • SU8 spin-coated + baked. Most wafers had defects (bubbles, or even comets).
  • UV exposure of flow pattern
  • The best wafer was post-expose baked. The others were left unpolymerised
  • Developed in PGMEA. The three non-baked wafers are now stripped and blank again.
  • Valid wafer verified by optical microscopy and contact profilometry. Some dust contamination, will need to be blow-cleaned before PDMS moulding.
  • The three other wafers can be cleaned and re-used (SRD, Pirana solution, 02 plasma strip).

For details of the process, see protocol for SU8 processes: [http://cmi.epfl.ch/photo/photo_process/files/Sawatec_processSU8.php| SU8 Process by CMI]

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